High-purity crystalline silica powder is fused using Tosoh’s proprietary oxy-hydrogen flame process. Because of its high purity, the glass contains very few bubbles and/or foreign matter, which ensures stability and high product quality. This glass is used widely for the reaction tubes and wafer boats used in semiconductor fabrication equipment and as a material for etching components. This group of products also includes plasma-fused products that feature excellent heat resistance.

High-purity crystalline silica powder is fused using Tosoh’s proprietary oxy-hydrogen flame process. This glass is a high-purity glass that boasts of excellent heat resistance and light-shielding properties with micro-bubbles dispersed throughout it. This glass is used widely in high-temperature processing equipment parts for semiconductor fabrication and solar cell manufacture, such as flanges.

High-purity crystalline silica powder is fused using Tosoh’s proprietary oxy-hydrogen flame process. This glass contains extremely few bubbles or foreign matter and has a purity comparable to synthetic quartz, giving it a high transmittance even in the vacuum ultraviolet region. This glass is used widely for semiconductor high-purity wafer processing equipment, etching components, excimer lamp tubes, and other equipment in which metal impurities cannot be tolerated.

High-purity crystalline silica powder is fused using Tosoh’s proprietary oxy-hydrogen flame process. It has the same high purity, heat resistance, and chemical resistance properties as silica glass. Silica glass wool is used as a heat-insulating material for filters and as filler in gas chromatography.