Product Information

Tosoh SGM Corporation’s extensive product offerings and technologies have been honed over many years to meet the diverse needs of our customers. The silica glass that we manufacture is broadly divided into two types: fused silica glass and synthetic silica glass. Each of these types is further divided into detailed grades according to their purpose of use.

Fused Silica Glass

Transparent Silica Glass

High-purity crystalline silica powder is fused using Tosoh’s proprietary oxy-hydrogen flame process. Because of its high purity, the glass contains very few bubbles and/or foreign matter, which ensures stability and high product quality. This glass is used widely for the reaction tubes and wafer boats used in semiconductor fabrication equipment and as a material for etching components. This group of products also includes plasma-fused products that feature excellent heat resistance.

Oxy-hydrogen Fusion	Grade	Features
Oxy-hydrogen Fusion	N	Standard grade for semiconductors: very few bubbles
	NP	High-purity version of N
Electric Fusion	HR	Standard grade for semiconductors: excellent heat resistance
	HRP	High-purity version of HR

Opaque Silica Glass

High-purity crystalline silica powder is fused using Tosoh’s proprietary oxy-hydrogen flame process. This glass is a high-purity glass that boasts of excellent heat resistance and light-shielding properties with micro-bubbles dispersed throughout it. This glass is used widely in high-temperature processing equipment parts for semiconductor fabrication and solar cell manufacture, such as flanges.

Manufacturing Method	Grade	Features
Oxy-hydrogen Fusion	OP-1	White opaque quartz for semiconductors
	OP-3	High-purity white opaque quartz for semiconductors
	OP-3HD	OP-3 grade with higher surface smoothness

Ultra-high-purity fused silica glass

High-purity crystalline silica powder is fused using Tosoh’s proprietary oxy-hydrogen flame process. This glass contains extremely few bubbles or foreign matter and has a purity comparable to synthetic quartz, giving it a high transmittance even in the vacuum ultraviolet region. This glass is used widely for semiconductor high-purity wafer processing equipment, etching components, excimer lamp tubes, and other equipment in which metal impurities cannot be tolerated.

Manufacturing Method	Grade	Features
Oxy-hydrogen Fusion	S	Ultra-high-purity fused silica glass with excellent light transmittance

Silica Glass Wool

High-purity crystalline silica powder is fused using Tosoh’s proprietary oxy-hydrogen flame process. It has the same high purity, heat resistance, and chemical resistance properties as silica glass. Silica glass wool is used as a heat-insulating material for filters and as filler in gas chromatography.

Grade	Features
Fine	Fiber diameter: 2 to 6 um
Coarse	Fiber diameter: 4 to 9 um