Tosoh SGM Corporation’s extensive product offerings and technologies have been honed over many years to meet the diverse needs of our customers. The silica glass that we manufacture is broadly divided into two types: fused silica glass and synthetic silica glass. Each of these types is further divided into detailed grades according to their purpose of use.
Fused Silica Glass
Transparent Silica Glass
High-purity crystalline silica powder is fused using Tosoh’s proprietary oxy-hydrogen flame process. Because of its high purity, the glass contains very few bubbles and/or foreign matter, which ensures stability and high product quality. This glass is used widely for the reaction tubes and wafer boats used in semiconductor fabrication equipment and as a material for etching components. This group of products also includes plasma-fused products that feature excellent heat resistance.
|Oxy-hydrogen Fusion||N||Standard grade for semiconductors: very few bubbles|
|NP||High-purity version of N|
|Electric Fusion||HR||Standard grade for semiconductors: excellent heat resistance|
|HRP||High-purity version of HR|
Opaque Silica Glass
High-purity crystalline silica powder is fused using Tosoh’s proprietary oxy-hydrogen flame process. This glass is a high-purity glass that boasts of excellent heat resistance and light-shielding properties with micro-bubbles dispersed throughout it. This glass is used widely in high-temperature processing equipment parts for semiconductor fabrication and solar cell manufacture, such as flanges.
|Oxy-hydrogen Fusion||OP-1||White opaque quartz for semiconductors|
|OP-3||High-purity white opaque quartz for semiconductors|
|OP-3HD||OP-3 grade with higher surface smoothness|
Ultra-high-purity fused silica glass
High-purity crystalline silica powder is fused using Tosoh’s proprietary oxy-hydrogen flame process. This glass contains extremely few bubbles or foreign matter and has a purity comparable to synthetic quartz, giving it a high transmittance even in the vacuum ultraviolet region. This glass is used widely for semiconductor high-purity wafer processing equipment, etching components, excimer lamp tubes, and other equipment in which metal impurities cannot be tolerated.
|Oxy-hydrogen Fusion||S||Ultra-high-purity fused silica glass with excellent light transmittance|
Silica Glass Wool
High-purity crystalline silica powder is fused using Tosoh’s proprietary oxy-hydrogen flame process. It has the same high purity, heat resistance, and chemical resistance properties as silica glass. Silica glass wool is used as a heat-insulating material for filters and as filler in gas chromatography.
|Fine||Fiber diameter: 2 to 6 um|
|Coarse||Fiber diameter: 4 to 9 um|